- Recovery of quantum efficiency on Cs/O-activated GaN and GaAs photocathodes by thermal annealing in vacuum
- Geometrical frustration and piezoelectric response in oxide ferroics
- Hybrid refractive-diffractive microlenses in glass by focused Xe ion beam
- Investigation of ma-N 2400 series photoresist as an electron-beam resist for superconducting nanoscale devices
- Nanoscale etching of perovskite oxides for field effect transistor applications
- Sidewall channel fabrication using membrane projection lithography and metal assisted chemical etching
- Ultrathin initiated chemical vapor deposition polymer interfacial energy control for directed self-assembly hole-shrink applications
- Self-aligned structures by a single-step through-membrane 100-keV electron beam lithography
- Hybrid refractive-diffractive microlenses in glass by focused Xe ion beam
- Effects of mask material conductivity on lateral undercut etching in silicon nano-pillar fabrication
- High-brightness source of energetic He atoms
- Double replication for characterizing cracks in surface-hardened polydimethylsiloxane
- Next generation of extreme-resolution electron beam lithography
- Nanoscale details of liquid drops on 1D patterned surfaces revealed by etching
- Ultrathin initiated chemical vapor deposition polymer interfacial energy control for directed self-assembly hole-shrink applications
