The system is more compact than the 3400 and 3600 models. A key feature is that it can be used with substantially smaller targets. This can be a big advantage for laboratory applications and production uses where precious metal targets, or other expensive materials are required. It may be configured without a vacuum load lock, with a simple linear high vacuum load lock or mated to a wafer handling platform with a cassette-to-cassette elevator load lock.
Modern nano scale technologies need precision fabrication tools. The 3000 ion beam deposition system delivers precision ion beams for sputter deposition applications and surface modification. Applications that the 3000 is used for include;
Semiconductor device metallisation.
Thin film magnetic devices.