This is the smallest of Nordiko’s sputtering systems. It uses an aluminium chamber and can accommodate up to four 75 mm sputtering cathodes. An alternative configuration is to install a single larger (150 or 200 mm) electrode. Each cathode may be configured for DC and or RF operation. The chamber is pumped by a 300 l.s-1turbomolecular pump backed by a 7 m3.hr-1 dry pump. The chamber also features a SEMI MESC-compatible port that can interface to vacuum load lock.
The rotary substrate table is water cooled. As an option, a heated table is also available. The table is mounted on a telescopic pedestal and can be electrically driven through 75 mm of vertical travel.
Operation of the system is automated. The control system is user-friendly and provides a mimic GUI (Graphical User Interface).