- Extreme contact shrink for back end of line connectivity
- Extreme contact shrink for back end of line connectivity
- Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement
- Reduction of exposing time in massively-parallel E-beam systems
- Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement
- Energy storage performance in lead-free antiferroelectric 0.92(Bi0.54Na0.46)TiO3-0.08BaTiO3 ultrathin films by pulsed laser deposition
- Investigation of the growth mechanism and crystallographic structures of GaSb dots nucleation layer and GaSb thin film grown on Si(001) substrate by molecular beam epitaxy
- Review of recent studies on nanoscale electrical junctions and contacts: Quantum tunneling, current crowding, and interface engineering
- Modification of β-gallium oxide electronic properties by irradiation with high-energy electrons
- Effect of V/III ratio and growth pressure on surface and crystal quality of AlN grown on sapphire by metal-organic chemical vapor deposition
- On the interplay between a novel iron and iron-carbide atomic layer deposition process, the carbon nanotube growth, and the metal–carbon nanotube coating properties on silica substrates
- Structure evolution and mechanical properties of co-sputtered Zr-Al-B2 thin films
- Carbon trimer as a 2 eV single-photon emitter candidate in hexagonal boron nitride: A first-principles study
- Absorbance enhancement of monolayer ${mathrm{MoS}}_{2}$ in a perfect absorbing system
- Optical dielectric properties of HfO2-based films
