The Nordiko 8800 PVD process module may be fitted with up to ten sputtering electrodes. It is scalable and can be configured for processing 200 and 300 mm wafers.
The module is designed for the fabrication of advanced MTJ structures. It uses an offset geometry between the target and substrate with wafer rotation to provide good within wafer non-uniformity.
The system uses a high capacity turbomolecular pump in concert with an in-chamber cryogenic cold plate to maintain a high quality environment during the deposition cycle.
Configured for long throw and the module is operated at low pressure to provide the benefits of a long mean free path for the sputtered material.
.
